Molecular-Scale Lithography | October 20, 2008 Issue - Vol. 86 Issue 42 | Chemical & Engineering News
Volume 86 Issue 42 | pp. 57-59
Issue Date: October 20, 2008

Molecular-Scale Lithography

Advances in block copolymer self-assembly may lead to applications in microelectronics
Department: Science & Technology

MOORE'S LAW, named for Intel cofounder Gordon E. Moore, predicts that the number of transistors on computer microprocessors will double every two years. Until now, standard photolithography, in which laser beams are used to generate patterns in masks and transfer those patterns to a substrate, has been sufficient to satisfy the need for tinier transistors.

But that might not be the case much longer.

"We can't shrink the features down much further" with standard photolithography, . . .

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