Issue Date: April 26, 2010
Nanopatterning Gets Smaller
IBM researchers have come up with a heated silicon atomic force microscope tip that can etch 3-D patterns on coated surfaces down to 15-nm feature sizes, breaking the 30-nm-resolution barrier of current industrial patterning techniques (Science, DOI: 10.1126/science.1187851). The scanning-probe nanolithography method could allow scientists to fabricate ever smaller and more precise computer chips and other microelectronic devices. Led by Armin W. Knoll of IBM’s research center in Zurich, the researchers attached the . . .
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