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Materials

Chemical makers advance lithography

by Michael McCoy
February 29, 2016 | APPEARED IN VOLUME 94, ISSUE 9

Suppliers of electronic materials are advancing the commercialization of two new lithographic methods for creating ultrathin circuit lines in computer chips. Brewer Science and Arkema say they have demonstrated pilot-scale production of polystyrene-polymethylmethacrylate block copolymers for use in directed self-assembly. The partners say the polymer will be used to support customer evaluation. Meanwhile, JSR and Imec, a Belgian research lab, have formalized a joint venture to create photoresists for extreme ultraviolet lithography, a competing technique for creating ultrathin circuitry.

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