Block Copolymers For Lithography | May 19, 2014 Issue - Vol. 92 Issue 20 | Chemical & Engineering News
 
 
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Volume 92 Issue 20 | pp. 8-12
Issue Date: May 19, 2014

Cover Story

Block Copolymers For Lithography

Low-cost alternative to classic methods for making electronic devices exploits molecular self-assembly
Department: Science & Technology
News Channels: Nano SCENE, Materials SCENE, Organic SCENE
Keywords: lithography, polymer, block copolymer, self assembly, directed self assembly

With blazing speed and seemingly limitless digital memory, the personal computers of the early 1990s rocketed past those that ranked as state-of-the-art just a couple of years earlier. Within a few years, the new computers were outpaced by even faster ones. And soon the faster ones also became outdated.

For decades, the electronics industry has cranked out one generation after another of ever-faster, smaller, more powerful, and less expensive devices. It has done so through . . .

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