Rohm And Haas Gets Metals Technology | Chemical & Engineering News
Volume 85 Issue 14 | p. 26 | Concentrates
Issue Date: April 2, 2007

Rohm And Haas Gets Metals Technology

Department: Business

Rohm and Haas is licensing a novel class of metal amidinate compounds from Harvard University. Developed by Harvard chemistry professor Roy Gordon, the compounds are precursors for making thin films of metals and metal compounds via atomic layer deposition. Under the agreement, Rohm and Haas will have exclusive rights to make and market the materials for semiconductor manufacturers. It intends to manufacture them at its North Andover, Mass., plant. Gordon says atomic layer deposition, a process for applying 1-atom-thick layers onto silicon wafers, will become more important as computer chips contain components smaller than 45 nm.

Chemical & Engineering News
ISSN 0009-2347
Copyright © American Chemical Society

Leave A Comment

*Required to comment