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Business

Rohm and Haas Opens lithography Facility

July 14, 2008 | A version of this story appeared in Volume 86, Issue 28
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Credit: Rohm and Haas

Rohm and Haas's electronic materials business has opened a $60 million facility in Marlborough, Mass., to support the R&D of semiconductor lithography materials that work with 193-nm light. Jim Fahey, president of the firm's microelectronic technologies business, says the facility supports the company's efforts to develop 193-nm photoresists and patterning materials such as antireflectants and topcoats for immersion lithography.

Chemical & Engineering News
ISSN 0009-2347
Copyright © 2024 American Chemical Society

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