Volume 86 Issue 28 | p. 22 | Concentrates
Issue Date: July 14, 2008

Rohm and Haas Opens lithography Facility

Department: Business
Credit: Rohm and Haas

Rohm and Haas's electronic materials business has opened a $60 million facility in Marlborough, Mass., to support the R&D of semiconductor lithography materials that work with 193-nm light. Jim Fahey, president of the firm's microelectronic technologies business, says the facility supports the company's efforts to develop 193-nm photoresists and patterning materials such as antireflectants and topcoats for immersion lithography.

 
Chemical & Engineering News
ISSN 0009-2347
Copyright © American Chemical Society

Leave A Comment

*Required to comment