Advertisement
Grab your lab coat. Let's get started
Welcome!
Welcome!
Create an account below to get 6 C&EN articles per month, receive newsletters and more - all free.
It seems this is your first time logging in online. Please enter the following information to continue.
As an ACS member you automatically get access to this site. All we need is few more details to create your reading experience.
Not you? Sign in with a different account.
Not you? Sign in with a different account.
ERROR 1
ERROR 1
ERROR 2
ERROR 2
ERROR 2
ERROR 2
ERROR 2
Password and Confirm password must match.
If you have an ACS member number, please enter it here so we can link this account to your membership. (optional)
ERROR 2
ACS values your privacy. By submitting your information, you are gaining access to C&EN and subscribing to our weekly newsletter. We use the information you provide to make your reading experience better, and we will never sell your data to third party members.
Business
Cabot Will Enter Polishing Pad Field
January 8, 2007
| A version of this story appeared in
Volume 85, Issue 2
Cabot Microelectronics is the latest company to enter the chemical mechanical planarization (CMP) polishing pad business. The company, already the leading supplier of CMP abrasive slurries, has launched Epic D100, which it calls a breakthrough in CMP polishing technology. Cabot Micro says the single-polymer pad is more consistent than conventional pads and lasts up to 30% longer. Applied Materials, the largest supplier of CMP equipment, entered the pad market late last year in a partnership with Praxair (C&EN, Dec. 11, 2006, page 20). Rohm and Haas is the largest pad supplier today with an estimated 90% market share.
You might also like...
The power is now in your (nitrile gloved) hands
Sign up for a free account to get more articles. Or choose the ACS option that’s right for you.
Already have an ACS ID? Log in
Join the conversation
Contact the reporter
Submit a Letter to the Editor for publication
Engage with us on Twitter