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Dow Corning will more than double capacity for a silicon polymer used to produce a new bilayer photoresist for semiconductor manufacturing. Dow Corning jointly developed the resist with Japanese photoresist maker TOK. In December, the companies announced that it is being used by a leading memory chip manufacturer in a 193-nm lithography process. Jeff Bremmer, global market manager for Dow Corning's silicon lithography solutions unit, says the expansion will make the resist available to a broader group of chip makers.
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