Advertisement
Grab your lab coat. Let's get started
Welcome!
Welcome!
Create an account below to get 6 C&EN articles per month, receive newsletters and more - all free.
It seems this is your first time logging in online. Please enter the following information to continue.
As an ACS member you automatically get access to this site. All we need is few more details to create your reading experience.
Not you? Sign in with a different account.
Not you? Sign in with a different account.
ERROR 1
ERROR 1
ERROR 2
ERROR 2
ERROR 2
ERROR 2
ERROR 2
Password and Confirm password must match.
If you have an ACS member number, please enter it here so we can link this account to your membership. (optional)
ERROR 2
ACS values your privacy. By submitting your information, you are gaining access to C&EN and subscribing to our weekly newsletter. We use the information you provide to make your reading experience better, and we will never sell your data to third party members.
Materials
Evonik Plans Silane Facility In Japan
by Michael McCoy
May 18, 2009
| A version of this story appeared in
Volume 87, Issue 20
Evonik Industries will spend about $170 million to build a facility in Yokkaichi, Japan, for monosilane and fumed silica. Used to deposit silicon in thin-film photovoltaic cells, monosilane is experiencing 20% annual growth, Evonik says. The company already produces monosilane, or SiH4, in Germany as a raw material for polycrystalline silicon and says it has new technology enabling the move into photovoltaic-grade monosilane. Silicon tetrachloride generated as a by-product of the process will be used to make fumed silica.
You might also like...
The power is now in your (nitrile gloved) hands
Sign up for a free account to get more articles. Or choose the ACS option that’s right for you.
Already have an ACS ID? Log in
Join the conversation
Contact the reporter
Submit a Letter to the Editor for publication
Engage with us on Twitter