Evonik Plans Silane Facility In Japan | May 18, 2009 Issue - Vol. 87 Issue 20 | Chemical & Engineering News
Volume 87 Issue 20 | p. 19 | Concentrates
Issue Date: May 18, 2009

Evonik Plans Silane Facility In Japan

Department: Business

Evonik Industries will spend about $170 million to build a facility in Yokkaichi, Japan, for monosilane and fumed silica. Used to deposit silicon in thin-film photovoltaic cells, monosilane is experiencing 20% annual growth, Evonik says. The company already produces monosilane, or SiH4, in Germany as a raw material for polycrystalline silicon and says it has new technology enabling the move into photovoltaic-grade monosilane. Silicon tetrachloride generated as a by-product of the process will be used to make fumed silica.

Chemical & Engineering News
ISSN 0009-2347
Copyright © American Chemical Society

Leave A Comment

*Required to comment