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Materials
DA Nanomaterials Wins Patent Case
by Michael McCoy
July 19, 2010
| A version of this story appeared in
Volume 88, Issue 29
A U.S. District Court jury has found that alumina- and silica-based chemical mechanical planarization (CMP) slurries sold by DA NanoMaterials do not infringe Cabot Microelectronics’ patents. DA Nano, a joint venture of DuPont and Air Products, says the ruling “reinforces the fact that our products are vastly different from Cabot’s.” Cabot Micro says it is considering an appeal of the verdict.
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