DA Nanomaterials Wins Patent Case | July 19, 2010 Issue - Vol. 88 Issue 29 | Chemical & Engineering News
Volume 88 Issue 29 | p. 18 | Concentrates
Issue Date: July 19, 2010

DA Nanomaterials Wins Patent Case

Department: Business
Keywords: litigation, chemical mechanical planarization, CMP
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DA Nano opened this lab in Hsinchu County, Taiwan, last year.
Credit: DA NanoMaterials
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DA Nano opened this lab in Hsinchu County, Taiwan, last year.
Credit: DA NanoMaterials

A U.S. District Court jury has found that alumina- and silica-based chemical mechanical planarization (CMP) slurries sold by DA NanoMaterials do not infringe Cabot Microelectronics’ patents. DA Nano, a joint venture of DuPont and Air Products, says the ruling “reinforces the fact that our products are vastly different from Cabot’s.” Cabot Micro says it is considering an appeal of the verdict.

 
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