Inpria to scale up EUV photoresists | Chemical & Engineering News
Volume 94 Issue 29 | p. 14 | Concentrates
Issue Date: July 18, 2016

Inpria to scale up EUV photoresists

Department: Business
Keywords: start-ups, photoresist, EUV, lithography

The electronic materials start-up Inpria plans to build a facility in Corvallis, Ore., to manufacture its metal oxide-based photoresists. Developed in Oregon State University’s chemistry department, the resists are intended to be used with extreme UV lithography to create computer chip circuit lines less than 7 nm wide. The company says it will pay for the plant by tapping into $10 million it raised from investors earlier this year.

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