Issue Date: July 18, 2016
Inpria to scale up EUV photoresists
The electronic materials start-up Inpria plans to build a facility in Corvallis, Ore., to manufacture its metal oxide-based photoresists. Developed in Oregon State University’s chemistry department, the resists are intended to be used with extreme UV lithography to create computer chip circuit lines less than 7 nm wide. The company says it will pay for the plant by tapping into $10 million it raised from investors earlier this year.
- Chemical & Engineering News
- ISSN 0009-2347
- Copyright © American Chemical Society