Advertisement

If you have an ACS member number, please enter it here so we can link this account to your membership. (optional)

ACS values your privacy. By submitting your information, you are gaining access to C&EN and subscribing to our weekly newsletter. We use the information you provide to make your reading experience better, and we will never sell your data to third party members.

ENJOY UNLIMITED ACCES TO C&EN

Electronic Materials

Shin-Etsu will build fourth resist plant

by Michael McCoy
April 18, 2024 | A version of this story appeared in Volume 102, Issue 12

 

Shin-Etsu Chemical will spend about $540 million to build its fourth semiconductor lithography material plant, in Isesaki, Japan. Shin-Etsu entered the lithography material business in 1997 with a facility for photoresists used in lithography based on light generated by krypton fluoride lasers. It later added resists for lithography that uses argon fluoride lasers and extreme ultraviolet light and is now one of the world’s top photoresist manufacturers. Shin-Etsu says the new facility will also include R&D labs.

Article:

This article has been sent to the following recipient:

0 /1 FREE ARTICLES LEFT THIS MONTH Remaining
Chemistry matters. Join us to get the news you need.