ADVERTISEMENT
2 /3 FREE ARTICLES LEFT THIS MONTH Remaining
Chemistry matters. Join us to get the news you need.

If you have an ACS member number, please enter it here so we can link this account to your membership. (optional)

ACS values your privacy. By submitting your information, you are gaining access to C&EN and subscribing to our weekly newsletter. We use the information you provide to make your reading experience better, and we will never sell your data to third party members.

ENJOY UNLIMITED ACCES TO C&EN

Industrial Safety

US chemical plant antiterrorism law extended

CFATS remains in effect until early 2020

by Jeff Johnson, special to C&EN
January 24, 2019 | APPEARED IN VOLUME 97, ISSUE 4

 

09704-polcon3-fence.jpg
Credit: Shutterstock

The day before a US antiterrorism statute affecting chemical companies was to expire on Jan. 19, President Donald J. Trump signed a 15-month extension of that law.

The 11-year-old Chemical Facility Anti-Terrorism Standards (CFATS) requires industrial facilities that make, use, or store specified quantities of any of more than 300 hazardous chemicals to assess their risks and submit site-security plans to the Department of Homeland Security for review and approval. The facilities must then implement protective measures based on their level of risk.

Approximately 3,500 of these facilities are considered high risk under CFATS. They must devise and implement department-approved, site-specific security plans.

Legislation to extend CFATS stalled last year in debate between Democrats in the House of Representatives and Republicans in the Senate. Led by Sen. Ron Johnson (R-WI), some senators want to make industry-backed changes to CFATS before they endorse a multiyear reauthorization of the law. House Democrats oppose that idea.

For now, lawmakers settled on a 15-month reauthorization extending the current law. This effectively sets a deadline early in 2020 for them to reach a compromise.

X

Article:

This article has been sent to the following recipient:

Leave A Comment

*Required to comment