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Electronic Materials
Sumitomo expands advanced photoresists
by Craig Bettenhausen
February 20, 2021
| A version of this story appeared in
Volume 99, Issue 6
Sumitomo Chemical will add production lines for argon fluoride and extreme ultraviolet photolithography resists at its plant in Osaka, Japan. The expansion builds on other advanced photoresist investments at the site, which the firm says exceed $94 million over the past 3 years. Overall, the moves will quadruple capacity in Osaka when completed in early 2022. Sumitomo expects demand for such photoresists to grow by 6% per year, driven by 5G mobile phones as well as personal computers and data centers that support increased teleworking.
Chemical & Engineering News
ISSN 0009-2347
Copyright © 2024 American Chemical Society
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