Advertisement
Grab your lab coat. Let's get started
Welcome!
Welcome!
Create an account below to get 6 C&EN articles per month, receive newsletters and more - all free.
It seems this is your first time logging in online. Please enter the following information to continue.
As an ACS member you automatically get access to this site. All we need is few more details to create your reading experience.
Not you? Sign in with a different account.
Not you? Sign in with a different account.
ERROR 1
ERROR 1
ERROR 2
ERROR 2
ERROR 2
ERROR 2
ERROR 2
Password and Confirm password must match.
If you have an ACS member number, please enter it here so we can link this account to your membership. (optional)
ERROR 2
ACS values your privacy. By submitting your information, you are gaining access to C&EN and subscribing to our weekly newsletter. We use the information you provide to make your reading experience better, and we will never sell your data to third party members.
Electronic Materials
Sumitomo expands advanced photoresists
by Craig Bettenhausen
February 20, 2021
| A version of this story appeared in
Volume 99, Issue 6
Sumitomo Chemical will add production lines for argon fluoride and extreme ultraviolet photolithography resists at its plant in Osaka, Japan. The expansion builds on other advanced photoresist investments at the site, which the firm says exceed $94 million over the past 3 years. Overall, the moves will quadruple capacity in Osaka when completed in early 2022. Sumitomo expects demand for such photoresists to grow by 6% per year, driven by 5G mobile phones as well as personal computers and data centers that support increased teleworking.
Chemical & Engineering News
ISSN 0009-2347
Copyright © 2024 American Chemical Society
The power is now in your (nitrile gloved) hands
Sign up for a free account to get more articles. Or choose the ACS option that’s right for you.
Already have an ACS ID? Log in
Join the conversation
Contact the reporter
Submit a Letter to the Editor for publication
Engage with us on X