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June 11, 2018 Issue

09624-cover-lab.jpg

June 11, 2018 Cover

Volume 96, Issue 24

Researchers experiment with area-selective atomic layer deposition to precisely place layers of conducting and insulating materials within circuits

Cover:This photo shows three researchers in a Stanford University lab.

Credit: ZhiHua Chen / Caption: At Stanford University, Stacey F. Bent (from left), Dara Bobb-Semple, and Tzu-Ling Liu devise strategies for making ALD a spatially selective tool for growing thin films.

Full Article
Volume 96 | Issue 24

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Quote of the Week

“The government is driving with one foot on the gas and the other on the brake.”

Johnsee Lee, chair , Taiwan Bio Industry

To shrink electronics further, innovative chemical deposition methods may save the day

Researchers experiment with area-selective atomic layer deposition to precisely place layers of conducting and insulating materials within circuits

  • Replacing methylene chloride in paint strippers

    Questions remain about the safety and effectiveness of alternative solvents

  • Renewable chemical maker Avantium tries for an encore performance

    After attracting BASF, catalysis expert seeks other partners for a new batch of projects

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Astrochemistry

Ancient organic molecules found on Mars

Curiosity rover also reports data on the red planet’s mysterious methane plumes

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